300 mm front-end & back-end research platform

With Fraunhofer IZM-ASSID and Fraunhofer IPMS-CNT, two research facilities unique in Germany are located in Saxony. The industry-oriented 300 mm wafer standard used in both facilities is crucial to create a fast transfer of research results to the semiconductor industry in Saxony, nationwide and also worldwide. Particularly in view of Germany's much-vaunted technological sovereignty in the field of semiconductors, know-how from the research side deep into industrial processes - as found in these two facilities - is of great importance. 

Fraunhofer IPMS (Center Nanoelectronic Technologies CNT)

Cleanroom at Fraunhofer IPMS-CNT.
  • Atomic Layer Deposition (ALD)
  • Nanopatterning / E-Beam Lithography
  • Chemical Mechanical Polishing (CMP)
  • Wafer Metallization
  • Wafer Cleaning
  • Wafer Services

Visit Fraunhofer IPMS-CNT website for more information.

Fraunhofer Institute for Reliability and Microintegration IZM

Cleanroom at Fraunhofer IZM-ASSID.
  • 2.5/3D Technologies
  • High Density Redistribution
  • Wafer-Bumping
  • Wafer-Bonden
  • Thinning/Singulation/Dicing
  • High-Density Assembly
  • Failure Analysis & Reliability Investigation
  • Sensor Development
  • Photonic & Plasmonic Systems

Visit Fraunhofer IZM-ASSID website for more information.