Infrastructure

Fraunhofer IZM-ASSID and Fraunhofer IPMS-CNT are two R&D facilities in the field of microelectronics that are unique in Germany:

• R&D activities based on 300 mm wafer industry standard equipment
• High competence/ unique selling proposition for front-end, back-end technologies as well as wafer-level system integration
  

The 300 mm Competence Center Fraunhofer Center for Advanced CMOS & Heterointegration Saxony is the consolidation of scientific and technical competencies to increase efficiency and complete the value chain, such as:

• Broader TRL spectrum to develop new IP as well as meet industry needs (manufacturability / pilot production).
• Access to state-of-the-art technologies for large enterprises and SMEs
• Offer of customer-specific projects within the performance center micro-nanointegration and in the research factory microelectronics Germany (FMD)
• Contribution to technology sovereignty and IP protection in D / EU (e.g. 6G, radar)
• Opportunity for partnership at the highest level (imec, Leti, IME)

• 3730 m² cleanroom and laboratory area
• 1300 m² expansion area
  
• ISO 6 and ISO 3 areas
• more than 80 production and research facilities for 300 mm
• ISO9001:2015 certified